CPL - Chalmers Publication Library
| Utbildning | Forskning | Styrkeområden | Om Chalmers | In English In English Ej inloggad.

A comparison of thermal stability in nanocrystalline Ni- and Co-based materials

Melina da Silva (Institutionen för material- och tillverkningsteknik, Yt- och mikrostrukturteknik) ; Uta Klement (Institutionen för material- och tillverkningsteknik, Yt- och mikrostrukturteknik)
Zeitschrift fur Metallkunde Vol. 96 (2005), 09, p. 1009-1014.
[Artikel, refereegranskad vetenskaplig]

In this paper the microstructural development upon annealing of nanocrystalline Ni- and Co-based electrodeposits is described. New investigations on Ni, Ní–Fe, and Co–P are compared with previous results on Ni, Co, and Ni–P in terms of microstructural changes and stabilizing mechanisms. The conclusions are: pure nanocrystalline Ni and Co are stabilized by impurities in the grain boundaries. In the case of Co, also an allotropic phase transformation influences the occurrence of abnormal grain growth. Alloying and/or adding solutes is found to increase thermal stability. While in Ni-20 at.% Fe the ordering transformation is expected to be the reason for stabilization, in strongly segregating systems (Ni–P and Co–P) the stabilizing effect is the decrease in grain boundary energy due to solute segregation. After precipitation, Zener pinning still hinders grain boundary migration, but not sufficient to stabilize the nanocrystalline structure.

Nyckelord: nanocrystalline materials, thermal stability, abnormal grain growth, transmission electron microscopy, in-situ annealing

Denna post skapades 2006-09-12. Senast ändrad 2014-09-02.
CPL Pubid: 7810


Institutioner (Chalmers)

Institutionen för material- och tillverkningsteknik, Yt- och mikrostrukturteknik



Chalmers infrastruktur

Relaterade publikationer

Denna publikation ingår i:

Thermal Stability of Electrodeposited Nanocrystalline Ni- and Co-Based Materials