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Novel monocrystalline silicon micromirrors for maskless lithography

Martin Bring (Institutionen för mikroteknologi och nanovetenskap) ; Peter Enoksson (Institutionen för mikroteknologi och nanovetenskap)

A novel monocrystalline silicon micromirror structure for improving image fidelity in laser pattern generators is presented. Analytical and finite element analysis of the structure as well as an outline of a fabrication scheme to realize the structure are given. The spring constant of the micromirror structure can be designed independently of the stiffness of the mirror surface. This makes it possible to design a mirror with very good planarity, resistance to sagging during actuation, and it reduces influence from stress in reflectivity-increasing multilayer coatings.

Nyckelord: Micromirrors, Maskless Lithography, Transfer bonding, Electrostatic actuation, EUV lithography, DRIE

Submitted to "Sensors and Actuators A: Physical", In Press, Corrected Proof

Denna post skapades 2008-01-04. Senast ändrad 2009-10-12.
CPL Pubid: 64403


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