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Characterization Techniques for Thin and Thick Ferroelectric Films

Anatoli Deleniv (Institutionen för mikroteknologi och nanovetenskap, Fysikalisk elektronik)
Journal of the European Ceramic Society (0955-2219). Vol. 27 (2007), 8-9, p. 2759-2764.
[Artikel, refereegranskad vetenskaplig]

A few measurement techniques are presented for characterization of thin and thick ferroelectric films at microwave frequencies. Broadband reflection type measurements using a probe station are considered for on wafer characterization of thin films. The accuracy of the method is analyzed with respect to measurement residual systematic errors. A test structure is introduced allowing quick and accurate extraction of the film parameters based on the rigorous full-wave model. Two measurement techniques are reported for electrode-less characterization of thick ferroelectric films. The first method (X-band) is based on the reflection type measurement of a resonator established by a layered alumina/ferroelectric sample loaded in a cut-off waveguide. The second method (B-band) utilizes an open resonator (OR) technique. Theoretical and experimental results are presented.

Nyckelord: Films, ferroelectrics, dielectric properties, impedance



Denna post skapades 2007-12-04.
CPL Pubid: 62414

 

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Institutioner (Chalmers)

Institutionen för mikroteknologi och nanovetenskap, Fysikalisk elektronik (2007-2010)

Ämnesområden

Övrig elektroteknik, elektronik och fotonik
Övrig teknisk materialvetenskap

Chalmers infrastruktur