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Radical Additions of Bis(trimethylsilyl)phosphite to Vinyltrimethylsilane and Vinyltriethoxysilane: Crystal Structure of 2-Trimethylsilylethylphosphonic Acid

Amir H. Mahmoudkhani ; Vratislav Langer (Institutionen för oorganisk miljökemi) ; Oliver Lindqvist (Institutionen för oorganisk miljökemi)
Phosphorus Sulfur and Silicon and the Related Elements (1042-6507). Vol. 178 (2003), 10, p. 2159-2168.
[Artikel, refereegranskad vetenskaplig]

Organosilicon-phosphonate compounds with the general formula (R)n(RO)3mnSi(CH2)mP(O)(OSiR'3)2 are designed for application as novel materials for surface treatments and modifications. A solvothermal method based on the reaction of bis(trimethylsilyl)phosphite with vinyltrimethylsilane and vinyltriethoxysilane in the presence of a peroxide in benzene solvent was used to synthesize the silyl-substituted esters of organosilicon-phosphonate compounds. 2-Trimethylsilylethanephosphonic acid was prepared from its bis(trimethylsilyl) ester by alcoholysis. The crystal structure of the acid consists of two-dimensional arrays built up from the (P--)O--H···O--P hydrogen bonds.

Nyckelord: Crystal Structure, Hydrogen Bonding, Supramolecular Array, Surface Treatment

Denna post skapades 2006-08-29. Senast ändrad 2013-06-04.
CPL Pubid: 3627


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