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In situ x-ray photoelectron spectroscopy studies of water on metals and oxides at ambient conditions

S. Yamamoto ; H. Bluhm ; K. Andersson ; Guido Ketteler (Institutionen för teknisk fysik) ; H. Ogasawara ; M. Salmeron ; A. Nilsson
Journal of Physics Condensed Matter (09538984). Vol. 20 (2008), 18,
[Artikel, refereegranskad vetenskaplig]

X-ray photoelectron spectroscopy (XPS) is a powerful tool for surface and interface analysis, providing the elemental composition of surfaces and the local chemical environment of adsorbed species. Conventional XPS experiments have been limited to ultrahigh vacuum (UHV) conditions due to a short mean free path of electrons in a gas phase. The recent advances in instrumentation coupled with third-generation synchrotron radiation sources enables in situ XPS measurements at pressures above 5Torr. In this paper, we describe the basic design of the ambient pressure XPS setup that combines differential pumping with an electrostatic focusing. We present examples of the application of in situ XPS to studies of water adsorption on the surface of metals and oxides including Cu(110), Cu(111), TiO2(110) under environmental conditions of water vapor pressure. On all these surfaces we observe a general trend where hydroxyl groups form first, followed by molecular water adsorption. The importance of surface OH groups and their hydrogen bonding to water molecules in water adsorption on surfaces is discussed in detail.

Denna post skapades 2017-11-06.
CPL Pubid: 252938


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