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An XPS method for layer profiling of NbN thin films

ОКИСЛЕНИЕ ПОВЕРХНОСТИ НАНОРАЗМЕРНЫХ ПЛЁНОК НИТРИДА НИОБИЯ

A. V. Lubenchenko ; A. A. Batrakov ; Alexey Pavolotsky (Institutionen för rymd- och geovetenskap, Avancerad mottagarutveckling) ; Sascha Krause (Institutionen för rymd- och geovetenskap, Avancerad mottagarutveckling) ; I. V. Shurkaeva ; O. I. Lubenchenko ; D. A. Ivanov
EPJ Web of Conferences. 25th Congress on Spectroscopy, SPECTROSCOPY.SU 2016; Moscow; Russian Federation; 3-7 October 2016 (21016275). Vol. 132 (2017), p. Art no 03053.
[Konferensbidrag, refereegranskat]

Layer chemical and phase profiling of niobium nitride thin films on a silicon substrate oxidized on air was performed with the help of a method designed by us. The method includes: a new method of background subtraction of multiple inelastically scattered photoelectrons considering depth inhomogeneity of electron inelastic scattering; a new method of photoelectron line decomposition into component peaks considering physical nature of different decomposition parameters; joint solution of the background subtraction and photoelectron line decomposition problems; control of line decomposition accuracy with the help of a suggested performance criterion; calculation of layer thicknesses for a multilayer target using a simple formula.



Denna post skapades 2017-01-20. Senast ändrad 2017-04-28.
CPL Pubid: 247528

 

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Institutioner (Chalmers)

Institutionen för rymd- och geovetenskap, Avancerad mottagarutveckling (2010-2017)

Ämnesområden

Rymd- och flygteknik

Chalmers infrastruktur

Onsala rymdobservatorium