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Photoluminescence from tensile-strained Ge quantum dots

Q Chen ; X Chen ; Z Zhang ; Y Song ; P Wang ; J Liu ; P Lu ; Y Li ; Q Gong ; Shumin Wang (Institutionen för mikroteknologi och nanovetenskap, Fotonik)
The 2016 IEEE Summer Topical Meeting Series, SUM 2016, Newport Beach, USA, July 11th-13th, 2016 p. 120-121. (2016)
[Konferensbidrag, refereegranskat]

It has been theoretically predicted that 1.9% biaxial tensile strain can convert Ge [1], which is compatible with Si CMOS technology, into a direct band-gap semiconductor, making it a candidate material for light sources on Si [2, 3]. Combining the advantage of tensile strain with quantum dot (QD), we proposed that tensile-strained QD is a new route toward light emission from Ge [4]. In this work, we chose In0.52Al0.48As, which is lattice matched to InP, as barrier layer and grew the structure by molecular beam epitaxy (MBE). Photoluminescence (PL) was successfully achieved at room temperature.



Denna post skapades 2016-10-21. Senast ändrad 2016-12-09.
CPL Pubid: 243815

 

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Institutioner (Chalmers)

Institutionen för mikroteknologi och nanovetenskap, Fotonik

Ämnesområden

Fysik

Chalmers infrastruktur