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Multiscale conformal pattern transfer

Kristof Lodewijks (Institutionen för fysik, Bionanofotonik (Chalmers)) ; Vladimir D. Miljkovic (Institutionen för fysik (Chalmers)) ; Ines Massiot (Institutionen för fysik, Bionanofotonik (Chalmers)) ; Addis Mekonnen (Institutionen för fysik (Chalmers)) ; Ruggero Verre (Institutionen för fysik, Bionanofotonik (Chalmers)) ; Eva Olsson (Institutionen för fysik, Eva Olsson Group (Chalmers)) ; Alexandre Dmitriev
Scientific Reports (2045-2322). Vol. 6 (2016), p. article no. 28490 .
[Artikel, refereegranskad vetenskaplig]

We demonstrate a method for seamless transfer from a parent flat substrate of basically any lithographic top-down or bottom-up pattern onto essentially any kind of surface. The nano-or microscale patterns, spanning macroscopic surface areas, can be transferred with high conformity onto a large variety of surfaces when such patterns are produced on a thin carbon film, grown on top of a sacrificial layer. The latter allows lifting the patterns from the flat parent substrate onto a water-air interface to be picked up by the host surface of choice. We illustrate the power of this technique by functionalizing broad range of materials including glass, plastics, metals, rough semiconductors and polymers, highlighting the potential applications in in situ colorimetry of the chemistry of materials, anti-counterfeit technologies, biomolecular and biomedical studies, light-matter interactions at the nanoscale, conformal photovoltaics and flexible electronics.

Nyckelord: colloidal lithography, etch rates, graphene, nanostructures, nanoparticle



Denna post skapades 2016-08-15. Senast ändrad 2016-08-26.
CPL Pubid: 240221

 

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Institutioner (Chalmers)

Institutionen för fysik, Bionanofotonik (Chalmers)
Institutionen för fysik (Chalmers)
Institutionen för fysik, Eva Olsson Group (Chalmers)
Institutionen för fysik (GU) (GU)

Ämnesområden

Fysik

Chalmers infrastruktur