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Effects of buffer layer preparation and Bi concentration on InGaAsBi epilayers grown by gas source molecular beam epitaxy

S. X. Zhou ; M. Qi ; L. K. Ai ; A. H. Xu ; Shumin Wang (Institutionen för mikroteknologi och nanovetenskap, Fotonik)
SEMICONDUCTOR SCIENCE AND TECHNOLOGY (0268-1242). Vol. 30 (2015), 12, p. Art. no. 125001.
[Artikel, refereegranskad vetenskaplig]

The effect of using an In0.53Ga0.47As buffer layer on the crystalline quality of InGaAsBi epilayer with Bi concentration up to 3.1% grown by gas source molecular beam epitaxy was investigated. It is found that use of the buffer layer has a dramatic effect on the improvement of surface morphology, structural, electrical and optical properties of InGaAsBi epilayers. Bi incorporation in InGaAs up to a concentration of 3.1% causes no degradation of the electron mobility and induces p-type carriers that compensate the background n-type carriers resulting in mobility enhancement with increasing Bi concentration. With the buffer layer preparation, a maximum electron mobility of 5550 cm(2) V-1 s(-1) at room temperature is demonstrated in InGaAsBi with x(Bi) = 3.1%, which is the highest value reported in InGaAsBi with x(Bi) > 2.5%.

Nyckelord: InGaAsBi, dilute bismide, molecular beam epitaxy

Denna post skapades 2016-02-10. Senast ändrad 2016-07-05.
CPL Pubid: 231881


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