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Production of nano-holes patten on Si(111) by colloidal lithography for growth of InAs nanowires

Elham Fadaly ; Ines Massiot (Institutionen för teknisk fysik, Bionanofotonik) ; Mahdad Sadeghi (Institutionen för mikroteknologi och nanovetenskap, Nanotekniklaboratoriet) ; Alexandre Dmitriev (Institutionen för teknisk fysik, Bionanofotonik) ; Huan Zhao (Institutionen för mikroteknologi och nanovetenskap, Terahertz- och millimetervågsteknik )
15th International Conference on Nanotechnology (2015)
[Konferensbidrag, refereegranskat]

Colloidal lithography is a simple, versatile and low-cost technique that can be used to pattern diverse nanostructures on a wafer scale. In this work, colloidal lithography utilizing polystyrene nanoparticles as a lift-off mask was used to produce nanohole patterns on Si (111) substrates. The hole size, which is determined by the size of the polystyrene particles, can be well controlled by oxygen plasma shrinking. Using this technique, we were able to obtain nanohole pattern with feature size down to 50 nm, which is close to the limit that conventional lithographic techniques can reach, in a time-efficient and cost effective manner. InAs nanowires were successfully grown on the patterned substrates using molecular beam epitaxy.

Nyckelord: Nanomaterials; semiconductors; colloidal lithography; InAs nanowires; MBE; selective area epitaxy

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Denna post skapades 2015-08-04.
CPL Pubid: 220168