CPL - Chalmers Publication Library
| Utbildning | Forskning | Styrkeområden | Om Chalmers | In English In English Ej inloggad.

Formation of multiple twinned structural units in electrodeposited nickel after annealing

Alexander Kahrimanidis (Institutionen för material- och tillverkningsteknik, Yt- och mikrostrukturteknik) ; Uta Klement (Institutionen för material- och tillverkningsteknik, Tillverkningsteknik)
Advanced Materials Research (1022-6680). Vol. 783-786 (2013), p. 2573-2578.
[Artikel, refereegranskad vetenskaplig]

Electrodeposition is an advanced synthesis technique which involves the creation of a coating or free-standing material through an electrolytic process. Organic additives such as saccharin have been frequently used in electroplating operations to moderate deposit growth rates and to control film quality. In the present study, plating of Nickel without additives has resulted in a sub-microcrystalline microstructure and a <110>-fibre texture in growth direction. Structural units in form of groups of grains possessing a common <110>-zone axis in growth direction and low-S relationships between them have been found in the microstructure by use of EBSD. Upon annealing, grain growth sets in. However, the structural units and the texture are preserved up to 550°C. This means that the structural units stabilize the microstructure; there is no orientation change when grain growth occurs (e.g. by twinning). The low-∑ boundaries of the structural units are described in detail and texture development upon annealing is discussed in connection with results from previous studies on Ni and Ni-alloys of different initial texture.

Nyckelord: 5-fold symmetry; EBSD; Electrodeposition; Grain growth; Nickel; Structural unit; Texture; Twin boundaries; Σ-grain boundaries

Denna post skapades 2015-05-07. Senast ändrad 2016-05-19.
CPL Pubid: 216751


Institutioner (Chalmers)

Institutionen för material- och tillverkningsteknik, Yt- och mikrostrukturteknik (2005-2017)
Institutionen för material- och tillverkningsteknik, Tillverkningsteknik (2005-2017)



Chalmers infrastruktur