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Thermal chemical vapor deposition grown graphene heat spreader for thermal management of hot spots

Zhaoli Gao (Institutionen för mikroteknologi och nanovetenskap) ; Yong Zhang (Institutionen för mikroteknologi och nanovetenskap, Bionanosystem) ; Y. F. Fu ; M. M. F. Yuen ; Johan Liu (Institutionen för mikroteknologi och nanovetenskap, Bionanosystem)
Carbon (0008-6223). Vol. 61 (2013), p. 342-348.
[Artikel, refereegranskad vetenskaplig]

Graphene of different layer numbers was fabricated using thermal chemical vapor deposition (TCVD), and it was demonstrated as a heat spreader in electronic packaging. Platinum thermal evaluation chips were used to evaluate the thermal performance of the graphene heat spreaders. The temperature of a hot spot driven at a heat flux of up to 430 W cm(-2) was decreased from 121 degrees C to 108 degrees C (Delta T approximate to 13 degrees C) with the insertion of the monolayer graphene heat spreader, compared with the multilayer (n = 6-10) ones' temperature drop of similar to 8 degrees C. Various parameters affecting the thermal performance of graphene heat spreaders were discussed, e.g. layer numbers of graphene, phonon scattering, thermal boundary resistance. We demonstrate the potentials of using a complementary metal oxide semiconductor compatible TCVD process to utilize graphene as a heat spreader for heat dissipation purposes.

Nyckelord: few-layer graphene, stacked bilayer graphene, single-crystal graphene, high-quality, large-area, ultrathin graphite, monolayer graphene, copper, foils, films, conductivity

Denna post skapades 2013-10-30.
CPL Pubid: 185872


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Institutioner (Chalmers)

Institutionen för mikroteknologi och nanovetenskap
Institutionen för mikroteknologi och nanovetenskap, Bionanosystem (2007-2015)


Den kondenserade materiens fysik

Chalmers infrastruktur