CPL - Chalmers Publication Library
| Utbildning | Forskning | Styrkeområden | Om Chalmers | In English In English Ej inloggad.

Patterned Substrate Epitaxy

Huan Zhao (Institutionen för mikroteknologi och nanovetenskap, Terahertz- och millimetervågsteknik ) ; Shumin Wang (Institutionen för mikroteknologi och nanovetenskap, Fotonik)
Lattice Engineering Technology and Applications p. 396. (2012)
[Kapitel]

In this chapter, we provide a brief overview of patterned substrate epitaxy (PSE) with intention to improve material quality of lattice mismatched thin films. We describe a short history, mechanisms of strain relaxation in diamond and zincblende heterostructures with small lattice mismatch when grown on large size blanket substrates and on patterned substrates, and implementation techniques.



Denna post skapades 2012-12-14.
CPL Pubid: 167877