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Adhesion layer-bottom electrode interaction during BaxSr1−xTiO3 growth as a limiting factor for device performance

Markus Löffler (Institutionen för teknisk fysik, Mikroskopi och mikroanalys) ; Andrei Vorobiev (Institutionen för mikroteknologi och nanovetenskap, Mikrovågselektronik) ; Lunjie Zeng (Institutionen för teknisk fysik, Mikroskopi och mikroanalys ; Institutionen för teknisk fysik, Eva Olsson Group ) ; Spartak Gevorgian (Institutionen för mikroteknologi och nanovetenskap, Terahertz- och millimetervågsteknik ) ; Eva Olsson (Institutionen för teknisk fysik, Mikroskopi och mikroanalys ; Institutionen för teknisk fysik, Eva Olsson Group )
Journal of Applied Physics (0021-8979). Vol. 111 (2012), 12, p. Art. no. 124514.
[Artikel, refereegranskad vetenskaplig]

Changes in bottom electrode morphology and adhesion layer composition upon deposition of BaxSr1-xTiO3 (BSTO) at elevated temperatures have been found, which have a negative impact on acoustic wave resonator device performance. The difference between nominal and actual adhesion layer composition are explained by grain boundary diffusion of Ti or W and their oxidation by in-diffusing oxygen, which leads to an increased interface roughness between the Pt bottom electrode and the BSTO. It is shown, that room-temperature deposited TiO2 diffusion barriers fail to protect against Ti oxidation and diffusion. Also W adhesion layers are prone to this phenomenon, which limits their ability to act as high temperature resistant adhesion layers for bottom electrodes for ferroelectric thin films.

Nyckelord: acoustic resonators, adhesion, barium compounds, diffusion barriers, ferroelectric thin films, grain boundary diffusion, interface roughness, oxidation, platinum, sputter deposition, strontium compounds, tungsten


Copyright (2012) American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in J. Appl. Phys. 111 (12), 124514 (2012) and may be found at http://link.aip.org/link/?jap/111/124514



Denna post skapades 2012-08-07. Senast ändrad 2015-02-09.
CPL Pubid: 161230

 

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