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Second order effects of aspect ratio variations in high sensitivity grating couplers

N Darwish ; L. Dieguez ; M. Moreno ; F. Muniz ; J. Mas ; J. Samiter ; Bengt Nilsson (Institutionen för mikroteknologi och nanovetenskap, Nanotekniklaboratoriet) ; Göran Petersson (Institutionen för mikroteknologi och nanovetenskap, Nanotekniklaboratoriet)
Microelectronic Engineering, Micro and Nano Engineering conference 17-20 September 2006, Barcelona, Spain (0167-9317). Vol. 84 (2007), 5-8, p. 1896-2011.
[Artikel, refereegranskad vetenskaplig]

In the following article we present our developments on how the geometrical parameters modify a grating-coupler sensitivity. Different sensors were fabricated, starting from the thin grating approximation (TGA), where the grating thickness is deprecated. Then, these devices were modified by varying etching depths and duty cycles. The sensors were modeled utilizing the equivalent layer approximation (ELA), and then the coupling angles were measured in the optical bench, showing an excellent agreement between model and reality. The same approximation was used to investigate how to improve the sensitivity of these devices. Another focus of attention was the integration of screen SiO2 layers over some grating paths for in-coupling and reference purposes.

Nyckelord: Optical biosensor; Grating coupler; Finite depth grating; e-Beam lithography

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Denna post skapades 2011-10-20. Senast ändrad 2012-05-15.
CPL Pubid: 147512


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