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TEM Investigation of the Microstructure of the Scale Formed on a FeCrAlRE Alloy at 900 A degrees C: The Effect of Y-rich RE Particles

Fang Liu (Institutionen för teknisk fysik, Mikroskopi och mikroanalys) ; Helena Götlind (Institutionen för kemi- och bioteknik, Oorganisk miljökemi) ; Jan-Erik Svensson (Institutionen för kemi- och bioteknik, Oorganisk miljökemi) ; Lars-Gunnar Johansson (Institutionen för kemi- och bioteknik, Oorganisk miljökemi) ; Mats Halvarsson (Institutionen för teknisk fysik, Mikroskopi och mikroanalys)
Oxidation of Metals (0030-770X). Vol. 74 (2010), 1-2, p. 11-32.
[Artikel, refereegranskad vetenskaplig]

Three oxide features: the thin and smooth protective oxide, reactive element (Ti-, Zr- or Y-rich) particles, and patches of thick oxide surrounding the Y-rich reactive element particles, were observed on a commercial FeCrAlRE alloy, Kanthal AF, exposed at 900 A degrees C. The microstructural development of the patches of thick oxide was investigated on samples exposed for 24 or 168 h in either dry O-2 or O-2 + 40% H2O. Analytical transmission electron microscopy in combination with site-precision TEM sample preparation by FIB/SEM was used. In all patches a thin but continuous inward growing alpha-Al2O3 layer was formed under a thick outward growing alumina layer, which initially consisted only of gamma-Al2O3. In dry O-2, transformation of gamma-Al2O3 (in the outer layer) to alpha-Al2O3 had started during 24 h and a considerable amount of gamma-Al2O3 had transformed after 168 h. The transformation originated immediately above the inward growing alpha-Al2O3. No such transformation occurred in O-2 + H2O. The possible effects of the Y-rich RE particles, as well as the effects of water vapour, on the oxidation were discussed.

Nyckelord: FeCrAl alloy, RE, Y, Al2O3, Microstructure, FIB/SEM, TEM, EDX, High, temperature oxidation, Water vapour, Phase transformation, oxidation resistance, alumina scales, oxide scales, kanthal af, dry, o-2, transient oxidation, reactive element, minor additions, 40-percent, h2o, adherence



Denna post skapades 2010-07-23. Senast ändrad 2016-08-18.
CPL Pubid: 123943

 

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Institutioner (Chalmers)

Institutionen för teknisk fysik, Mikroskopi och mikroanalys (2005-2012)
Institutionen för kemi- och bioteknik, Oorganisk miljökemi (2005-2014)

Ämnesområden

Kemiteknik

Chalmers infrastruktur