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Hole mask colloidal lithography on magnetic multilayers for spin torque applications

Sohrab R. Sani ; Johan Persson ; Alexandre Dmitriev (Institutionen för teknisk fysik, Bionanofotonik) ; Mikael Käll (Institutionen för teknisk fysik, Bionanofotonik) ; Johan Åkerman
Journal of Physics Conference Series. International Conference on Magnetism (ICM 2009). Karlsruhe, GERMANY. JUL 26-31, 2009 (1742-6588). Vol. 200 (2010), p. 072078.
[Konferensbidrag, refereegranskat]

We demonstrate the fabrication of metallic nano-contacts on magnetic multilayers using a Hole Mask Colloidal Lithography technique (HCL) based on Polystyrene spheres. The method applies PMMA as a sacrificial layer upon which a hole pattern is formed after lift- off of the spheres. An Au layer functions as a hard mask for the PMMA and the PMMA subsequently masks the SiO2 during its etching. The resulting pattern is a dense collection of randomly located nano-holes through a SiO2 film. Final devices are made using traditional photolithography to define a 600 nm circular mesa with about 3 to 4 nano-holes per device, and patterning of a metallic top contact.

Article Number: UNSP 072078

Denna post skapades 2010-06-11. Senast ändrad 2017-10-03.
CPL Pubid: 122649


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Institutioner (Chalmers)

Institutionen för teknisk fysik, Bionanofotonik (2007-2015)
Institutionen för fysik (GU) (GU)



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