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Ultrawide-band tunable true-time delay lines using ferroelectric varactors

Dan Kuylenstierna (Institutionen för mikroteknologi och nanovetenskap, Mikrovågselektronik) ; Andrei Vorobiev (Institutionen för mikroteknologi och nanovetenskap, Mikrovågselektronik) ; Peter Linnér (Institutionen för mikroteknologi och nanovetenskap, Mikrovågselektronik) ; Spartak Gevorgian (Institutionen för mikroteknologi och nanovetenskap, Mikrovågselektronik)
IEEE Transactions on Microwave Theory and Techniques (0018-9480). Vol. 53 (2005), 6, pt.2, p. 2164-70.
[Artikel, refereegranskad vetenskaplig]

This paper reports on compact tunable true-time delay lines based on ferroelectric (Ba/sub 0.25/Sr/sub 0.75/TiO/sub 3/) varactors integrated on high-resistivity silicon. The delay lines are based on lumped elements, physically implemented as synthetic coplanar-strip lines. An approximate analytical design procedure, exactly valid for omega to 0, is proposed. The physical size of the fabricated delay lines is 2.0*0.33 mm/sup 2/, including bias pads. Measurements are performed from room temperature (RT) down to 80 K. The measurements reveal ultrawide-band characteristics for both group delay and insertion loss. At RT, the absolute group delay is tau /sub delta /(RT, 0 V) approximately=70 ps with tunability of 20% under 20-V dc bias, the insertion less than 3.5 dB, and the reflection loss better than 12 dB below 20 GHz. At 145 K, the absolute group delay is increased to tau /sub delta /(145 K, 0 V) approximately=100 ps with a tunability of 50% under 20-V applied bias. At 7 GHz, the insertion loss is 3 dB, resulting in figures-of-merit of 0.03 dB/ps and 50 ps/mm. The leakage current at RT is less than 0.1 mu A

Nyckelord: barium compounds, coplanar waveguides, delay lines, ferroelectric devices, strip lines, strontium compounds, varactors

Denna post skapades 2006-08-29. Senast ändrad 2014-09-02.
CPL Pubid: 11865


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Institutioner (Chalmers)

Institutionen för mikroteknologi och nanovetenskap, Mikrovågselektronik


Elektroteknik och elektronik

Chalmers infrastruktur